NEO™ Product Line
Trymax Semiconductor Equipment BV, we have been developing our NEO™ product line since 2005. By basing ourselves on the features demanded by our customers, and a set of new fresh ideas. We have created an innovative, user-friendly and flexible semiconductor manufacturing platform unique in the industry.
Our expertise in etching, ashing and cleaning technologies in the semiconductor industry provided us with the knowledge to develop solutions that answer the needs of today's semiconductor production requirements.
The NEO™ platform is designed for the highest throughput at the lowest cost. With leading microwave technology by the Trymax MiRaGe™ plasma source, we achieve the highest throughput for all resist strip applications today. Combined with our RF technology the NEO platform is the ideal tool for advanced MEMS, TSV, EWLB, and polymer removal applications.
Our NEO2000 platform is a configurable single or dual chamber system developed for up to 200mm substrates, where the NEO3000 is designed for 200mm and 300mm substrates. Both platforms are designed from a reliability and maintainability point of view and offer the highest throughput, smallest footprint and most competitive pricing in the market today.